发明授权
- 专利标题: Nonvolatile semiconductor memory device and method for manufacturing same
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US12722920申请日: 2010-03-12
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公开(公告)号: US08541866B2公开(公告)日: 2013-09-24
- 发明人: Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Junya Matsunami , Tomoko Fujiwara
- 申请人: Ryota Katsumata , Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi , Ryouhei Kirisawa , Junya Matsunami , Tomoko Fujiwara
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-072486 20090324
- 主分类号: H01L29/00
- IPC分类号: H01L29/00
摘要:
A nonvolatile semiconductor memory device, includes: a stacked structural unit including a plurality of stacked component units stacked in a first direction, each of the stacked component units including a first conducting film made of a semiconductor of a first conductivity type provided perpendicular to the first direction and a first insulating film stacked in the first direction with the first conducting film; a semiconductor pillar piercing the stacked structural unit in the first direction and including a conducting region of a second conductivity type, the semiconductor pillar including a first region opposing each of the first conducting films, and a second region provided between the first regions with respect to the first direction, the second region having a resistance different from a resistance of the first region; and a second insulating film provided between the semiconductor pillar and the first conducting film.
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