Invention Grant
- Patent Title: Light emitting device and fabrication method thereof
- Patent Title (中): 发光元件及其制造方法
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Application No.: US13235063Application Date: 2011-09-16
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Publication No.: US08546819B2Publication Date: 2013-10-01
- Inventor: Yeo Jin Yoon , Chang Yeon Kim
- Applicant: Yeo Jin Yoon , Chang Yeon Kim
- Applicant Address: KR Ansan-si
- Assignee: Seoul Opto Device Co., Ltd.
- Current Assignee: Seoul Opto Device Co., Ltd.
- Current Assignee Address: KR Ansan-si
- Agency: H. C. Park & Associates, PLC
- Priority: KR10-2006-0136681 20061228; KR10-2006-0136682 20061228; KR10-2006-0136683 20061228
- Main IPC: H01L27/15
- IPC: H01L27/15

Abstract:
A method of fabricating a vertical light emitting diode including: growing a low doped first semiconductor layer on a sacrificial substrate; forming an aluminum layer on the low doped first semiconductor; forming an AAO layer having a large number of holes formed therein by anodizing the aluminum layer; etching and patterning the low doped first semiconductor layer using the aluminum layer as a shadow mask, thereby forming grooves; removing the aluminum layer remaining; sequentially forming a high doped first semiconductor layer, an active layer and a second semiconductor layer on the low doped first semiconductor layer with the grooves; forming a metal reflective layer and a conductive substrate on the second semiconductor layer; separating the sacrificial substrate; and forming an electrode pad on the other surface of the low doped first semiconductor layer, the electrode pad filled in the grooves and in ohmic contact with the high doped first semiconductor.
Public/Granted literature
- US20120241787A1 LIGHT EMITTING DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2012-09-27
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