发明授权
- 专利标题: Non-electrolytic deposition method
- 专利标题(中): 非电解沉积法
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申请号: US12995290申请日: 2009-06-23
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公开(公告)号: US08551561B2公开(公告)日: 2013-10-08
- 发明人: Sandrine Duluard , Claudine Biver
- 申请人: Sandrine Duluard , Claudine Biver
- 申请人地址: FR Charenton le Pont
- 专利权人: Essilor International (compagnie Generale d'optiqu)
- 当前专利权人: Essilor International (compagnie Generale d'optiqu)
- 当前专利权人地址: FR Charenton le Pont
- 代理机构: Occhiuti Rohlicek & Tsao LLP
- 优先权: FR0854341 20080627
- 国际申请: PCT/FR2009/051194 WO 20090623
- 国际公布: WO2009/156692 WO 20091230
- 主分类号: B05D5/12
- IPC分类号: B05D5/12 ; G02F1/153
摘要:
The invention relates to a method for the non-electrolytic deposition of a compound, preferably an electrochromic compound, comprising the following successive steps: (a) an electroconductive layer is deposited on a non-conductive solid substrate; (b) a reducing agent or an oxidizing agent (=redox agent) is deposited on an area of said electroconductive layer, said area covering only a portion of the surface of said electroconductive layer; and (c) a solution of a precursor of the compound to be deposited is brought into contact both with the redox agent and with at least a portion of the area of said electroconductive layer not covered by the redox agent, said precursor being chosen from those having an oxidation-reduction potential higher or lower than the redox agent and forming, after an oxidation-reduction reaction, a compound insoluble in the solution of the precursor of the compound to be deposited.
公开/授权文献
- US20110070361A1 NON-ELECTROLYTIC DEPOSITION METHOD 公开/授权日:2011-03-24
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