发明授权
US08552082B2 Alkali-soluble polymer compound and photosensitive resin composition using the same
有权
碱溶性高分子化合物和使用其的感光性树脂组合物
- 专利标题: Alkali-soluble polymer compound and photosensitive resin composition using the same
- 专利标题(中): 碱溶性高分子化合物和使用其的感光性树脂组合物
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申请号: US13096522申请日: 2011-04-28
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公开(公告)号: US08552082B2公开(公告)日: 2013-10-08
- 发明人: Keon Woo Lee , Sang Kyu Kwak , Chang Soon Lee , Hye Hyeon Kim
- 申请人: Keon Woo Lee , Sang Kyu Kwak , Chang Soon Lee , Hye Hyeon Kim
- 申请人地址: KR Seoul
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Rothwell, Figg, Ernst & Manbeck, P.C.
- 优先权: KR10-2010-0039662 20100428
- 主分类号: C08F2/50
- IPC分类号: C08F2/50 ; H05B6/68 ; B29C71/04
摘要:
A novel alkali-soluble polymer compound including a dehydrogenated pimaric acid and/or its isomer as a repeating unit, and a photosensitive resin composition including the alkali-soluble polymer compound as an effective binder matrix are provided. A photosensitive resin composition using the alkali-soluble polymer compound including a dehydrogenated resin acid has excellent photosensitivity and developing characteristics cause a less deformation in a firing process, has excellent elasticity. Thus, the photosensitive resin composition is advantageous for curing various transparent photosensitive materials, in particular, materials of column spacers, an overcoat, a passivation layer, or the like, used for fabricating color filters of an LCD.
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