Invention Grant
US08555492B2 Method for manufacturing a conductive substrate structure with conductive channels formed by using a two-sided cut approach
有权
制造具有通过使用双面切割方法形成的导电通道的导电基板结构的方法
- Patent Title: Method for manufacturing a conductive substrate structure with conductive channels formed by using a two-sided cut approach
- Patent Title (中): 制造具有通过使用双面切割方法形成的导电通道的导电基板结构的方法
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Application No.: US13338410Application Date: 2011-12-28
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Publication No.: US08555492B2Publication Date: 2013-10-15
- Inventor: Bily Wang , Sung-Yi Hsiao , Jack Chen
- Applicant: Bily Wang , Sung-Yi Hsiao , Jack Chen
- Applicant Address: TW Hsinchu
- Assignee: Harvatek Corporation
- Current Assignee: Harvatek Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Rosenberg, Klein & Lee
- Main IPC: H05K3/04
- IPC: H05K3/04

Abstract:
A conductive substrate structure includes a substrate unit, a conductive pad unit, and a conductive layer unit. The substrate unit has a top surface, a bottom surface, two opposite lateral surfaces, and a front surface. The conductive pad unit has at least two first conductive pads separated from each other and disposed on the top surface, and at least two second conductive pads separated from each other and disposed on the bottom surface. The conductive layer unit has at least two first conductive layers formed on the front surface and respectively electrically connected to two front sides of the two first conductive pads, and at least two second conductive layers respectively formed on the two opposite lateral surfaces and respectively electrically connected to two opposite lateral sides of the two second conductive pads. The two first conductive layers are respectively electrically connected with the two second conductive layers.
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