Invention Grant
- Patent Title: Vacuum ejector and vacuum apparatus having the same
- Patent Title (中): 具有相同的真空喷射器和真空装置
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Application No.: US13051088Application Date: 2011-03-18
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Publication No.: US08556594B2Publication Date: 2013-10-15
- Inventor: Hyun-Wook Kim , Yong-Wook Kim , Tea-Jin Park
- Applicant: Hyun-Wook Kim , Yong-Wook Kim , Tea-Jin Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, PA
- Priority: KR10-2010-0024208 20100318
- Main IPC: F04F5/20
- IPC: F04F5/20 ; F04F5/46
Abstract:
A vacuum pump ejector may include ejector body and a nozzle. The ejector body may have a passageway through which fluids may flow. The passageway may have an orifice. The nozzle may inject a purging gas to the orifice. The ejector may decrease a pressure between the vacuum pump and the scrubber, so that the vacuum pump may have improved efficiency. Thus, the vacuum pump may be effectively operated.
Public/Granted literature
- US20110229346A1 Vacuum Ejector and Vacuum Apparatus Having the Same Public/Granted day:2011-09-22
Information query
