发明授权
US08557069B2 Optical display device manufacturing system and optical display device manufacturing method
有权
光学显示装置制造系统和光学显示装置的制造方法
- 专利标题: Optical display device manufacturing system and optical display device manufacturing method
- 专利标题(中): 光学显示装置制造系统和光学显示装置的制造方法
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申请号: US12922803申请日: 2009-04-10
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公开(公告)号: US08557069B2公开(公告)日: 2013-10-15
- 发明人: Kazuo Kitada , Tomokazu Yura , Satoru Koshio , Takuya Nakazono
- 申请人: Kazuo Kitada , Tomokazu Yura , Satoru Koshio , Takuya Nakazono
- 申请人地址: JP Ibaraki-shi
- 专利权人: Nitto Denko Corporation
- 当前专利权人: Nitto Denko Corporation
- 当前专利权人地址: JP Ibaraki-shi
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2008-104964 20080414; JP2009-082629 20090330
- 国际申请: PCT/JP2009/057370 WO 20090410
- 国际公布: WO2009/128405 WO 20091022
- 主分类号: B32B41/00
- IPC分类号: B32B41/00
摘要:
Provided are an optical display device manufacturing system and an optical display device manufacturing method which can more preferably carry out a defect inspection. A detection condition of a defect in the inspection of an optical film before being bonded to an optical display unit carried out by a defect inspection apparatus (14, 24) is corrected based on the result of inspection of the optical display device with the optical film bonded, carried out by an inspection apparatus (30), and the optical film including the defects detected by the defect inspection apparatuses (14, 24) based on the corrected detection condition are excluded. Accordingly, since it is possible to adjust the standard of the defect inspection carried out by the defect inspection apparatus (14, 24) in conformity to the standard of the defect inspection which is later carried out by the inspection apparatus (30), it is possible to more preferably carry out the defect inspection, and it is possible to improve a yield ratio of the optical film.