Invention Grant
- Patent Title: Integrated decoupling capacitor employing conductive through-substrate vias
- Patent Title (中): 集成的去耦电容采用导电贯穿衬底通孔
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Application No.: US12614883Application Date: 2009-11-09
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Publication No.: US08558345B2Publication Date: 2013-10-15
- Inventor: Tae Hong Kim , Edmund J. Sprogis , Michael F. McAllister , Michael J. Shapiro
- Applicant: Tae Hong Kim , Edmund J. Sprogis , Michael F. McAllister , Michael J. Shapiro
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Wenjie Li
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/94 ; H01L23/04 ; H01L21/02

Abstract:
A capacitor in a semiconductor substrate employs a conductive through-substrate via (TSV) as an inner electrode and a columnar doped semiconductor region as an outer electrode. The capacitor provides a large decoupling capacitance in a small area, and does not impact circuit density or a Si3D structural design. Additional conductive TSV's can be provided in the semiconductor substrate to provide electrical connection for power supplies and signal transmission therethrough. The capacitor has a lower inductance than a conventional array of capacitors having comparable capacitance, thereby enabling reduction of high frequency noise in the power supply system of stacked semiconductor chips.
Public/Granted literature
- US20110108948A1 INTEGRATED DECOUPLING CAPACITOR EMPLOYING CONDUCTIVE THROUGH-SUBSTRATE VIAS Public/Granted day:2011-05-12
Information query
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