发明授权
- 专利标题: Defect inspection apparatus and method utilizing multiple inspection conditions
- 专利标题(中): 使用多种检查条件的缺陷检查装置和方法
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申请号: US12078097申请日: 2008-03-27
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公开(公告)号: US08558999B2公开(公告)日: 2013-10-15
- 发明人: Koji Kawaki , Atsushi Takane , Hiroshi Kikuchi , Nobuhiro Obara , Yuji Inoue
- 申请人: Koji Kawaki , Atsushi Takane , Hiroshi Kikuchi , Nobuhiro Obara , Yuji Inoue
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2007-084680 20070328
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.
公开/授权文献
- US20080239292A1 Apparatus and method for inspecting defects 公开/授权日:2008-10-02
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