Invention Grant
- Patent Title: Diamino acid derivative starting material, manufacturing method thereof, and diamino acid derivative manufacturing method
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Application No.: US12922008Application Date: 2009-02-27
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Publication No.: US08563765B2Publication Date: 2013-10-22
- Inventor: Shu Kobayashi , Yasuhiro Yamashita , Kazutaka Seki
- Applicant: Shu Kobayashi , Yasuhiro Yamashita , Kazutaka Seki
- Applicant Address: JP Kawaguchi-shi
- Assignee: Japan Science and Technology Agency
- Current Assignee: Japan Science and Technology Agency
- Current Assignee Address: JP Kawaguchi-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-058993 20080310
- International Application: PCT/JP2009/053681 WO 20090227
- International Announcement: WO2009/113409 WO 20090917
- Main IPC: C07C229/00
- IPC: C07C229/00
Abstract:
Provided is an efficient technology for synthesizing diamino acids (diamino acid derivatives). Disclosed is a manufacturing method for diamino acid derivatives wherein the fluorenyl groups of the diamino acid derivative starting materials represented by General Formula [II] or [IV] are removed.
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