Invention Grant
US08564078B2 Method for producing a micromechanical component having a trench structure for backside contact
有权
用于制造具有用于背面接触的沟槽结构的微机械部件的方法
- Patent Title: Method for producing a micromechanical component having a trench structure for backside contact
- Patent Title (中): 用于制造具有用于背面接触的沟槽结构的微机械部件的方法
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Application No.: US13291350Application Date: 2011-11-08
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Publication No.: US08564078B2Publication Date: 2013-10-22
- Inventor: Roland Scheuerer , Heribert Weber , Eckhard Graf
- Applicant: Roland Scheuerer , Heribert Weber , Eckhard Graf
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Kenyon & Kenyon LLP
- Priority: DE102007019638 20070426
- Main IPC: H01L29/84
- IPC: H01L29/84

Abstract:
A method for manufacturing a micromechanical component is proposed. In this context, at least one trench structure having a depth less than the substrate thickness is to be produced in a substrate. In addition, an insulating layer and a filler layer are produced or applied on a first side of the substrate. The filler layer comprises a filler material that substantially fills up the trench structure. A planar first side of the substrate is produced by way of a subsequent planarization within a plane of the filler layer or of the insulating layer or of the substrate. A further planarization of the second side of the substrate is then accomplished. A micromechanical component that is manufactured in accordance with the method is also described.
Public/Granted literature
- US20120049301A1 METHOD FOR PRODUCING A MICROMECHANICAL COMPONENT HAVING A TRENCH STRUCTURE FOR BACKSIDE CONTACT Public/Granted day:2012-03-01
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