Invention Grant
- Patent Title: Surface shape measuring apparatus, exposure apparatus, and device manufacturing method
- Patent Title (中): 表面形状测量装置,曝光装置和装置制造方法
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Application No.: US12393767Application Date: 2009-02-26
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Publication No.: US08564761B2Publication Date: 2013-10-22
- Inventor: Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
- Applicant: Wataru Yamaguchi , Takahiro Matsumoto , Hideki Ina
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP2008-048176 20080228
- Main IPC: G03B27/72
- IPC: G03B27/72

Abstract:
A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element.
Public/Granted literature
- US20090219499A1 SURFACE SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-09-03
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