发明授权
US08575592B2 Group III nitride based light emitting diode structures with multiple quantum well structures having varying well thicknesses 有权
具有多个量子阱结构的具有不同孔厚度的III族氮化物基发光二极管结构

Group III nitride based light emitting diode structures with multiple quantum well structures having varying well thicknesses
摘要:
A Group III nitride based light emitting diode includes a p-type Group III nitride based semiconductor layer, an n-type Group III nitride based semiconductor layer that forms a P-N junction with the p-type Group III nitride based semiconductor layer, and a Group III nitride based active region on the n-type Group III nitride based semiconductor layer. The active region includes a plurality of sequentially stacked Group III nitride based wells including respective well layers. The plurality of well layers includes a first well layer having a first thickness and a second well layer having a second thickness. The second well layer is between the P-N junction and the first well layer, and the second thickness is greater than the first thickness.
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