Invention Grant
- Patent Title: Lithographic apparatus and method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US12893577Application Date: 2010-09-29
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Publication No.: US08576373B2Publication Date: 2013-11-05
- Inventor: Hako Botma , Johannes Aldegonda Theodorus Marie Van Den Homberg
- Applicant: Hako Botma , Johannes Aldegonda Theodorus Marie Van Den Homberg
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54 ; G03B27/72
Abstract:
A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.
Public/Granted literature
- US20110149255A1 Lithographic Apparatus and Method Public/Granted day:2011-06-23
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