Invention Grant
- Patent Title: Observing device and method
- Patent Title (中): 观察装置和方法
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Application No.: US12665588Application Date: 2008-06-13
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Publication No.: US08582202B2Publication Date: 2013-11-12
- Inventor: Hirotoshi Terada , Hiroshi Tanabe
- Applicant: Hirotoshi Terada , Hiroshi Tanabe
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2007-163188 20070620
- International Application: PCT/JP2008/060893 WO 20080613
- International Announcement: WO2008/156038 WO 20081224
- Main IPC: G02B21/00
- IPC: G02B21/00

Abstract:
When it is detected that a solid immersion lens comes into contact with the semiconductor device, the lens is caused to vibrate by a vibration generator unit. Next, a reflected light image from the lens is input to calculate a reflected light quantity of the reflected light image, and it is judged whether a ratio of the reflected light quantity to an incident light quantity is not greater than a threshold value. When the ratio is greater than the threshold value, it is judged that optical close contact between the lens and the semiconductor device is not achieved, and the lens is again caused to vibrate. When the ratio is not greater than the threshold value, it is judged that optical close contact between the lens and the semiconductor device is achieved, and an observed image of the semiconductor device is acquired.
Public/Granted literature
- US20100202041A1 OBSERVING DEVICE AND METHOD Public/Granted day:2010-08-12
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