-
1.发明授权Semiconductor failure analysis apparatus, failure analysis method, and failure analysis program 有权半导体故障分析装置，故障分析方法和故障分析程序公开(公告)号：US07805691B2
公开(公告)日：2010-09-28
申请号：US11586719
申请日：2006-10-26
IPC分类号： G06F17/50
CPC分类号： G01R31/311 , G01N21/95607 , G01R31/2894
摘要： A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, and a failure analyzer 13 for analyzing a failure. The failure analyzer 13 extracts candidate nets passing at least one of analysis regions set from the failure observed image, out of a plurality of nets in the semiconductor device, and passage counts of the respective candidate nets through the analysis regions, selects a candidate net with the largest passage count as a first failure net, and selects a second failure net with attention to analysis regions where the first failure net does not pass. This substantializes a semiconductor failure analysis apparatus, failure analysis method, and failure analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device using the failure observed image.
摘要翻译： 故障分析装置10由用于获取半导体装置的故障观察图像P2的检查信息获取部11，用于获取布局信息的布局信息获取部12以及用于分析故障的故障分析部13构成。 故障分析部13从通过半导体装置的多个网络中的故障观察图像，从故障观察图像设定的分析区域中的至少一个以及通过分析区域的各个候选网络的通过计数来提取候补网络，选择候补网络 作为第一故障网络的最大通行数，并且选择第二故障网络，注意第一故障网络不通过的分析区域。 这实现了半导体故障分析装置，故障分析方法和故障分析程序，其能够安全有效地执行使用故障观察图像的半导体器件的故障的分析。
-
公开(公告)号：US20100172035A1
公开(公告)日：2010-07-08
申请号：US12664105
申请日：2008-06-13
申请人： Hirotoshi Terada , Hiroshi Tanabe
发明人： Hirotoshi Terada , Hiroshi Tanabe
IPC分类号： G02B7/02
CPC分类号： G02B21/33 , G01N21/9501 , G02B7/022 , G02B21/0016 , G02B21/02 , G02B21/248
摘要： A solid immersion lens holder 200 includes a holder main body 8 having a lens holding unit 60 that holds a solid immersion lens 6, and an objective lens socket 9 for attaching the holder main body 8 to a front end of an objective lens 21. The solid immersion lens 6 is held in a state of being unfixed to be free with respect to the lens holding unit 60. A vibration generator unit 120 that causes the holder main body 8 to vibrate is attached to the objective lens socket 9. The vibration generator unit 120 has a vibrating motor 140 held by a motor holding member 130, and a weight 142 structured to be eccentric by weight is attached to an output shaft 141 of the vibrating motor 140. A vibration generated in the vibration generator unit 120 is transmitted to the solid immersion lens 6 via the objective lens socket 9 and the holder main body 8. Thereby, achieving the solid immersion lens holder capable of improving the close contact between the solid immersion lens and an observation object.
摘要翻译： 固体浸没透镜保持器200包括具有保持固体浸没透镜6的透镜保持单元60的保持器主体8和用于将保持器主体8附接到物镜21的前端的物镜插座9。 固体浸没透镜6被保持为相对于透镜保持单元60不固定的状态。使保持器主体8振动的振动发生器单元120附接到物镜插座9.振动发生器 单元120具有由电动机保持构件130保持的振动电动机140，并且被构造为重量偏心的重物142附接到振动电动机140的输出轴141.在振动发生器单元120中产生的振动被传递到 固体浸没透镜6经由物镜插座9和保持器本体8.由此，实现能够改善固体浸没透镜和观察对象之间的紧密接触的固体浸没透镜保持器。
-
3.发明申请Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method 审中-公开样品观察方法，显微镜和固体浸没透镜，该方法中使用的光学接触液体公开(公告)号：US20080158667A1
公开(公告)日：2008-07-03
申请号：US12071895
申请日：2008-02-27
申请人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
发明人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/8806 , G01N21/9501 , G01N2021/0342 , G02B21/0004
摘要： Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.
摘要翻译： 将含有两亲性分子的光学接触液滴在作为检查对象的样品的半导体器件上（S104），在其上设置固体浸没透镜（S105）。 然后调整固体浸没透镜的插入位置（S106）。 然后干燥光学接触液体（S108），从而将固体浸没透镜与半导体器件进行光学 - 紧密接触。 结果，可以实现样品观察方法和显微镜等，其中固体浸没透镜可以容易地对准样品上的期望位置，并且固体浸没透镜可以牢固地进行光学紧密接触 与样品。
-
4.发明申请Semiconductor failure analysis apparatus, failure analysis method, and failure analysis program 有权半导体故障分析装置，故障分析方法和故障分析程序公开(公告)号：US20070294053A1
公开(公告)日：2007-12-20
申请号：US11586719
申请日：2006-10-26
IPC分类号： G01R31/00
CPC分类号： G01R31/311 , G01N21/95607 , G01R31/2894
摘要： A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, and a failure analyzer 13 for analyzing a failure. The failure analyzer 13 extracts candidate nets passing at least one of analysis regions set from the failure observed image, out of a plurality of nets in the semiconductor device, and passage counts of the respective candidate nets through the analysis regions, selects a candidate net with the largest passage count as a first failure net, and selects a second failure net with attention to analysis regions where the first failure net does not pass. This substantializes a semiconductor failure analysis apparatus, failure analysis method, and failure analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device using the failure observed image.
摘要翻译： 失效分析装置10由用于获取半导体器件的故障观察图像P 2的检查信息获取器11，用于获取布局信息的布局信息获取器12以及用于分析故障的故障分析器13组成。 故障分析部13从通过半导体装置的多个网络中的故障观察图像，从故障观察图像设定的分析区域中的至少一个以及通过分析区域的各个候选网络的通过计数来提取候补网络，选择候补网络 作为第一故障网络的最大通行数，并且选择第二故障网络，注意第一故障网络不通过的分析区域。 这实现了半导体故障分析装置，故障分析方法和故障分析程序，其能够安全有效地执行使用故障观察图像的半导体器件的故障的分析。
-
5.发明申请Semiconductor failure analysis apparatus, failure analysis method, and failure analysis program 审中-公开半导体故障分析装置，故障分析方法和故障分析程序公开(公告)号：US20070290696A1
公开(公告)日：2007-12-20
申请号：US11586720
申请日：2006-10-26
IPC分类号： G01R31/302
CPC分类号： G01R31/303
摘要： A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, and a failure analyzer 13 for analyzing a failure of the semiconductor device. The failure analyzer 13 has an analysis region setter for comparing an intensity distribution in the failure observed image with a predetermined intensity threshold to extract a reaction region arising from a failure, and for setting an analysis region used in the failure analysis of the semiconductor device, in correspondence to the reaction region. This substantializes a semiconductor failure analysis apparatus, failure analysis method, and failure analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device using the failure observed image.
摘要翻译： 故障分析装置10由用于获取半导体器件的故障观察图像P 2的检查信息获取器11，用于获取布局信息的布局信息获取器12以及用于分析半导体器件的故障的故障分析器13构成。 故障分析器13具有分析区域设定器，用于将故障观察图像中的强度分布与预定强度阈值进行比较，以提取由故障引起的反应区域，并且用于设定在半导体器件的故障分析中使用的分析区域， 对应于反应区域。 这实现了半导体故障分析装置，故障分析方法和故障分析程序，其能够安全有效地执行使用故障观察图像的半导体器件的故障的分析。
-
公开(公告)号：US07221502B2
公开(公告)日：2007-05-22
申请号：US10804195
申请日：2004-03-19
申请人： Hirotoshi Terada , Ikuo Arata
发明人： Hirotoshi Terada , Ikuo Arata
IPC分类号： G02B21/00
CPC分类号： G01N21/1717 , G01N21/8806 , G01N21/9501 , G01N2021/0342 , G02B21/02 , G02B21/365
摘要： For a semiconductor device S as a sample of an observed object, there are provided an image acquisition part 1 for carrying out observation of the semiconductor device S, and an optical system 2 comprising an objective lens 20. A solid immersion lens (SIL) 3 for magnifying an image of the semiconductor device S is arranged movable between an insertion position where the solid immersion lens includes an optical axis from the semiconductor device S to the objective lens 20 and is in close contact with a surface of the semiconductor device S, and a standby position off the optical axis. Then an image containing reflected light from SIL 3 is acquired with the SIL 3 at the insertion position, and the insertion position of SIL 3 is adjusted by SIL driver 30, with reference to the image. This realizes a semiconductor inspection apparatus (microscope) capable of readily performing observation of the sample necessary for an analysis of microstructure of a semiconductor device or the like, and a semiconductor inspection method (sample observation method) therewith.
摘要翻译： 对于作为观察对象的样本的半导体器件S，提供了用于执行半导体器件S的观察的图像获取部分1和包括物镜20的光学系统2。 用于放大半导体器件S的图像的固体浸没透镜（SIL）3被布置成可以在固体浸没透镜包括从半导体器件S到物镜20的光轴的插入位置和与物镜20紧密接触的位置之间移动 半导体器件S的表面和离开光轴的待机位置。 然后，通过SIL 3在插入位置获取包含来自SIL 3的反射光的图像，并且参考图像，通过SIL驱动器30调整SIL 3的插入位置。 这实现了能够容易地观察对半导体装置等的微结构进行分析所需的样品的半导体检查装置（显微镜）以及半导体检查方法（样本观察方法）。
-
公开(公告)号：US06973233B1
公开(公告)日：2005-12-06
申请号：US10089866
申请日：2000-10-06
CPC分类号： G01N21/6456 , G01J3/10 , G01N2021/6463 , G01N2021/6484
摘要： In a wavelength-variable light outputting apparatus, a diffraction grating 8 and a shielding member 11 which make wavelength and light quantity variable are attached to galvanometric scanners 12, 13, respectively, and the latter are swung, whereby the wavelength can be made variable at a high speed while in a state where the light quantity is kept constant. Such an apparatus is useful for capturing a fluorescent image of a biological sample in particular. By way of the shielding member 11, light is made incident on the optical fiber 10 and is outputted therefrom, whereby a biological sample SM can effectively be irradiated with light.
摘要翻译： 在波长可变光输出装置中，使波长和光量可变的衍射光栅8和屏蔽部件11分别安装在电流计扫描器12,13上，并且后者被摆动，由此波长可以变化 在光量保持恒定的状态下的高速度。 这种装置特别用于捕获生物样品的荧光图像。 通过屏蔽部件11，光入射到光纤10上并被输出，从而可以有效地照射生物样品SM。
-
公开(公告)号：US20050190436A1
公开(公告)日：2005-09-01
申请号：US10880100
申请日：2004-06-30
CPC分类号： G02B21/0016 , G02B21/33 , Y10S359/90
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index no and a thickness to of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index no and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译： 对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式中进行观察，该两种控制模式包括SIL 3位于待机位置的第一模式，并且基于第一模式的基板的折射率no和厚度对其执行聚焦和像差校正 半导体器件S和第二模式，其中SIL 3位于插入位置，并且基于衬底的折射率no和厚度t 0 0进行聚焦和像差校正， 和折射率n 1 1，厚度d 1，以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
-
公开(公告)号：US08619377B2
公开(公告)日：2013-12-31
申请号：US13375496
申请日：2010-05-28
IPC分类号： G02B7/02
CPC分类号： G02B21/33 , G02B7/16 , G02B21/248 , G02B27/32
摘要： A solid immersion lens supporting device includes a lens holder 30 that holds a solid immersion lens 20 in a free state in which a lens bottom surface 22 protrudes downward through a lower opening 32 so as not to fix the solid immersion lens, and a lens cover 40 which is provided to an upper opening 31 of the lens holder 30, and in which a cover bottom surface 42 on the solid immersion lens 20 side is on a plane perpendicular to an optical axis, the lens cover coming into one-point contact with a spherical lens top surface 21 of the solid immersion lens 20. Further, the lens cover 40 is provided with a positioning portion which is capable of carrying out positioning of the solid immersion lens 20 with respect to the objective lens with reference to an image of the lens cover 40 observed via the objective lens. Thereby, the immersion lens supporting device which is capable of efficiently carrying out movement, installation, and positioning of the immersion lens onto a sample is realized.
摘要翻译： 固体浸没透镜支撑装置包括：透镜保持器30，其保持固体浸没透镜20处于自由状态，透镜底面22通过下开口32向下突出，以便不固定固体浸没透镜;以及透镜盖 40，其被提供到透镜保持器30的上开口31，并且固体浸没透镜20侧的盖底面42位于与光轴垂直的平面上，透镜盖与 固体浸没透镜20的球面透镜顶表面21.此外，透镜盖40设置有能够相对于物镜执行固体浸没透镜20相对于物镜的定位的定位部分 通过物镜观察透镜盖40。 由此，可以实现能够有效地进行浸渍透镜的移动，安装和定位的浸没透镜支撑装置。
-
公开(公告)号：US20130100283A1
公开(公告)日：2013-04-25
申请号：US13806476
申请日：2011-06-17
申请人： Hirotoshi Terada
发明人： Hirotoshi Terada
IPC分类号： H04N7/18
摘要： An image generation device 1 comprises a laser light source 3, a laser output control unit 11, a laser scanner 5 for scanning an irradiation position of the laser light, a modulation pattern control unit 15 for controlling the laser output control unit 11 and laser scanner 5 so as to irradiate the object A with illumination light having a plurality of spatial modulation patterns, an imaging device 7 for capturing observation light brought from the object A in response to irradiation with the illumination light having the plurality of spatial modulation patterns so as to acquire a plurality of pattern images, and an image data operation unit 19 for generating a high-resolution image of the object A by using the plurality of pattern images acquired by the imaging device 7.
摘要翻译： 图像生成装置1包括激光光源3，激光输出控制部11，激光扫描部5，用于对激光的照射位置进行扫描的调制图案控制部15，激光输出控制部11和激光扫描器 以便对物体A照射具有多个空间调制图案的照明光;成像装置7，用于响应于具有多个空间调制图案的照明光的照射，捕获从物体A产生的观察光，从而 获取多个图案图像，以及图像数据操作单元19，用于通过使用由成像装置7获取的多个图案图像来生成对象A的高分辨率图像。
-
-
-
-
-
-
-
-
-
搜索结果
42 条记录 (耗时 0.019 秒)
