发明授权
- 专利标题: Semiconductor device and manufacturing method of the same
- 专利标题(中): 半导体器件及其制造方法相同
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申请号: US13060737申请日: 2010-02-25
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公开(公告)号: US08587087B2公开(公告)日: 2013-11-19
- 发明人: Daisuke Arai , Yoshito Nakazawa , Norio Hosoya
- 申请人: Daisuke Arai , Yoshito Nakazawa , Norio Hosoya
- 申请人地址: JP Kawasaki-shi
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kawasaki-shi
- 代理机构: Miles & Stockbridge P.C.
- 国际申请: PCT/JP2010/052990 WO 20100225
- 国际公布: WO2011/104850 WO 20110901
- 主分类号: H01L29/74
- IPC分类号: H01L29/74
摘要:
In order to improve characteristics of an IGBT, particularly, to reduce steady loss, turn-off time and turn-off loss, a thickness of a surface semiconductor layer is set to about 20 nm to 100 nm in an IGBT including: a base layer; a buried insulating film provided with an opening part; the surface semiconductor layer connected to the base layer below the opening part; a p type channel forming layer formed in the surface semiconductor layer; an n+ type source layer; a p+ type emitter layer; a gate electrode formed over the surface semiconductor layer via a gate insulating film; an n+ type buffer layer; and a p type collector layer.
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