发明授权
- 专利标题: Skew sensitive calculation for misalignment from multi patterning
- 专利标题(中): 对多图案化的偏移的偏移计算
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申请号: US13561189申请日: 2012-07-30
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公开(公告)号: US08589831B1公开(公告)日: 2013-11-19
- 发明人: Chih-Hsien Chang , Min-Shueh Yuan , Tsung-Hsien Tsai
- 申请人: Chih-Hsien Chang , Min-Shueh Yuan , Tsung-Hsien Tsai
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Eschweiler & Associates, LLC
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
Some aspects of the present disclosure provide for a method of accurately simulating variations in an operating parameter, due to processing variations caused by a multi-patterning exposure, by reducing the impact of layout sections having a large width and spacing. The method assigns a skew sensitive index to one or more sections of a multi-patterning layer formed with a first mask. Runlengths of the one or more sections are respectively multiplied by an assigned skew sensitive index to determine a skew variation for each of the one or more sections. The overall skew variation sum is then determined by summing the skew variation for each of the one or more sections. By separately determining the effects of processing variations (e.g., mask misalignment) for different sections of a multi-patterning layer, an accurate measurement of operating parameter variations is achieved.