发明授权
- 专利标题: Stage control device, stage control method and microscope
- 专利标题(中): 舞台控制装置,舞台控制方法和显微镜
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申请号: US13075672申请日: 2011-03-30
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公开(公告)号: US08593730B2公开(公告)日: 2013-11-26
- 发明人: Takashi Yamamoto , Yu Hirono , Fumiyasu Suzuki
- 申请人: Takashi Yamamoto , Yu Hirono , Fumiyasu Suzuki
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: K&L Gates LLP
- 优先权: JPP2010-088939 20100407
- 主分类号: G02B21/26
- IPC分类号: G02B21/26
摘要:
A stage control device including a position detection portion which detects a position deviation of a support plate relative to a reference position regulated by a convex portion provided in a stage, from an image of a scope including the support plate on which a sample is disposed and which is mounted on the stage; and a stage control portion that presses the stage, which is moved and controlled in a surface direction of the support plate so that the sample is in an imaging scope of an imaging element, from a position of a detection point in time in a direction corresponding to a position deviation at a pressing speed, and returns the stage up to a position of the detection point in time at a return speed slower than the pressing speed, when the position deviation of the support plate relative to the reference position is detected.
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