Invention Grant
- Patent Title: TARC material for immersion watermark reduction
- Patent Title (中): TARC材料用于浸没水印缩减
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Application No.: US13525796Application Date: 2012-06-18
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Publication No.: US08597870B2Publication Date: 2013-12-03
- Inventor: Ching-Yu Chang
- Applicant: Ching-Yu Chang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/11
Abstract:
A coating material for use during a lithography process. In an example, a coating material disposed on a material layer includes a polymer and a quencher catcher chemically bonded to the polymer. The quencher catcher substantially neutralizes any quencher that diffuses into the coating material from the material layer.
Public/Granted literature
- US20120258400A1 NOVEL TARC MATERIAL FOR IMMERSION WATERMARK REDUCTION Public/Granted day:2012-10-11
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