发明授权
- 专利标题： Method for junction avoidance on edge of workpieces
- 专利标题（中）： 工件边缘接合避免的方法
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申请号： US13248056申请日： 2011-09-29
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公开(公告)号： US08598021B2公开(公告)日： 2013-12-03
- 发明人: Julian Blake , Dale Stone
- 申请人： Julian Blake , Dale Stone
- 申请人地址： US MA Gloucester
- 专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人： Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址： US MA Gloucester
- 主分类号： H01L21/425
- IPC分类号： H01L21/425
摘要：
A method of implanting ions into a workpiece without the formation of junctions, which impact the performance of the workpiece, is disclosed. To counteract the effect of dopant being implanted into the edge of the workpiece, components made of material having an opposite conductivity are placed near the workpiece. As ions from the beam strike these components, ions from the material are sputtered. These ions have the opposite conductivity as the implanted ions, and therefore inhibit the formation of junctions.
公开/授权文献
- US20130084694A1 JUNCTION AVOIDANCE ON EDGES OF WORKPIECES 公开/授权日：2013-04-04
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