公开(公告)号：US07381969B2

公开(公告)日：2008-06-03

申请号：US11409759

申请日：2006-04-24

申请人： Tariq Fasheh ,  James Carroll ,  Klaus Petry ,  Dale Stone ,  Lyudmila Stone ,  Dave Wiederspahn

发明人： Tariq Fasheh ,  James Carroll ,  Klaus Petry ,  Dale Stone ,  Lyudmila Stone ,  Dave Wiederspahn

IPC分类号： H01J37/18

CPC分类号： H01L21/67201 ,  Y10S414/139

摘要： A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one such valves is a passthrough valve for removal of and insertion of workpieces from and into a load lock interior. A second fast acting valve also opens to atmosphere. A pressure rise inside the loadlock interior is monitored and when the pressure reaches a threshold pressure above atmosphere the fast acting valve is opened to atmosphere. This second fast acting valve is configured to relieve overpressure from the passthrough valve prior to opening of said passthrough valve. Workpiece movement is accomplished with the aid of a robot which reaches into the loadlock interior as it is either depositing workpieces or retrieving them. This system and process minimizes particle contamination of the load lock interior as well as contamination in the region outside the loadlock near the passthrough valve and any scheduled workpieces.

摘要翻译： 用于对加载锁加压的控制。 该控制通过将气源连接到负载锁内部来启动负载锁内部的加压。 代表性的加载锁包括压力传感器和多个阀，其中至少一个这样的阀是用于从工作装置锁定内部移除和插入工件的直通阀。 第二个快动作阀也向大气敞开。 监控负载锁内部的压力上升，当压力达到高于大气压的阈值压力时，快速作用阀向大气开放。 该第二快动阀构造成在打开所述通气阀之前减轻通气阀的过压。 工件运动是借助于一个机器人来实现的，该机器人可以通过放置工件或检索它们而进入到装载锁内部。 该系统和过程最大限度地减少了负载锁内部的颗粒污染以及穿通阀附近的负载锁定区域和任何预定工件的污染。

公开(公告)号：US20130084694A1

公开(公告)日：2013-04-04

申请号：US13248056

申请日：2011-09-29

申请人： Julian Blake ,  Dale Stone

发明人： Julian Blake ,  Dale Stone

IPC分类号： H01L21/265

CPC分类号： H01L21/26513 ,  H01L21/2658 ,  H01L31/068 ,  H01L31/186 ,  Y02E10/547 ,  Y02P70/521

摘要： A method of implanting ions into a workpiece without the formation of junctions, which impact the performance of the workpiece, is disclosed. To counteract the effect of dopant being implanted into the edge of the workpiece, components made of material having an opposite conductivity are placed near the workpiece. As ions from the beam strike these components, ions from the material are sputtered. These ions have the opposite conductivity as the implanted ions, and therefore inhibit the formation of junctions.

摘要翻译： 公开了一种将离子注入工件而不形成影响工件性能的接合点的方法。 为了抵消注入到工件边缘中的掺杂剂的影响，由具有相反电导率的材料制成的部件被放置在工件附近。 当来自光束的离子撞击这些组分时，来自材料的离子被溅射。 这些离子具有与注入离子相反的导电性，因此抑制结的形成。

公开(公告)号：US20080100983A1

公开(公告)日：2008-05-01

申请号：US11582814

申请日：2006-10-18

申请人： Ashwin M. Purohit ,  Dale Stone ,  Dave Broyer ,  Steve Drummond

发明人： Ashwin M. Purohit ,  Dale Stone ,  Dave Broyer ,  Steve Drummond

IPC分类号： H01T23/00

CPC分类号： H01L21/6831 ,  Y10S414/141

摘要： The present invention is directed to a system and a method for peeling a wafer off of an electrostatic clamp (ESC). The ESC removal system comprises a electrostatic clamp and a wafer electrically coupled and physically in contact with each other. A plurality of grippers or pins are arranged with respect to the wafer and the ESC to allow the wafer to be peeled off or removed section by section from the electrostatic clamp. The system and method allow the wafer to be removed with a much lower pull force than current systems and methods.

摘要翻译： 本发明涉及一种用于从静电夹（ESC）剥离晶片的系统和方法。 ESC去除系统包括电耦合和物理上彼此接触的静电夹和晶片。 相对于晶片和ESC布置多个夹持器或销，以允许晶片从静电夹具逐个剥离或逐个移除。 该系统和方法允许以比当前系统和方法更低的拉力去除晶片。

公开(公告)号：US20070246658A1

公开(公告)日：2007-10-25

申请号：US11409759

申请日：2006-04-24

申请人： Tariq Fasheh ,  James Carroll ,  Klaus Petry ,  Dale Stone ,  Lyudmila Stone ,  Dave Wiederspahn

发明人： Tariq Fasheh ,  James Carroll ,  Klaus Petry ,  Dale Stone ,  Lyudmila Stone ,  Dave Wiederspahn

IPC分类号： H01J37/18

CPC分类号： H01L21/67201 ,  Y10S414/139

摘要： A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one such valves is a passthrough valve for removal of and insertion of workpieces from and into a load lock interior. A second fast acting valve also opens to atmosphere. A pressure rise inside the loadlock interior is monitored and when the pressure reaches a threshold pressure above atmosphere the fast acting valve is opened to atmosphere. This second fast acting valve is configured to relieve overpressure from the passthrough valve prior to opening of said passthrough valve. Workpiece movement is accomplished with the aid of a robot which reaches into the loadlock interior as it is either depositing workpieces or retrieving them. This system and process minimizes particle contamination of the load lock interior as well as contamination in the region outside the loadlock near the passthrough valve and any scheduled workpieces.

摘要翻译： 用于对加载锁加压的控制。 该控制通过将气源连接到负载锁内部来启动负载锁内部的加压。 代表性的加载锁包括压力传感器和多个阀，其中至少一个这样的阀是用于从工作装置锁定内部移除和插入工件的直通阀。 第二个快动作阀也向大气敞开。 监控负载锁内部的压力上升，当压力达到高于大气压的阈值压力时，快速作用阀向大气开放。 该第二快动阀构造成在打开所述通气阀之前减轻通气阀的过压。 工件运动是借助于一个机器人来实现的，该机器人可以通过放置工件或检索它们而进入到装载锁内部。 该系统和过程最大限度地减少了负载锁内部的颗粒污染以及穿通阀附近的负载锁定区域和任何预定工件的污染。

公开(公告)号：US20060071181A1

公开(公告)日：2006-04-06

申请号：US10956817

申请日：2004-10-01

申请人： Lyudmila Stone ,  Scott Barusso ,  Dale Stone ,  Alexander Perel

发明人： Lyudmila Stone ,  Scott Barusso ,  Dale Stone ,  Alexander Perel

IPC分类号： H01J37/317

CPC分类号： H01J37/3171

摘要： An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.

摘要翻译： 离子束注入机包括离子束形成和引导装置以及其中用离子束注入离子的工件的注入站。 光束沿着从离子源到注入站的抽真空路径行进。 柔性波纹管将植入站耦合到波束形成和引导装置，允许植入站相对于波束形成和引导装置枢转，从而改变相对于离子束的工件的注入取向。 可替换的柔性波纹管衬套设置在波纹管的内部区域内，以减小沉积在波纹管内表面上的植入副产物的体积。

公开(公告)号：US08598021B2

公开(公告)日：2013-12-03

申请号：US13248056

申请日：2011-09-29

申请人： Julian Blake ,  Dale Stone

发明人： Julian Blake ,  Dale Stone

IPC分类号： H01L21/425

CPC分类号： H01L21/26513 ,  H01L21/2658 ,  H01L31/068 ,  H01L31/186 ,  Y02E10/547 ,  Y02P70/521

摘要： A method of implanting ions into a workpiece without the formation of junctions, which impact the performance of the workpiece, is disclosed. To counteract the effect of dopant being implanted into the edge of the workpiece, components made of material having an opposite conductivity are placed near the workpiece. As ions from the beam strike these components, ions from the material are sputtered. These ions have the opposite conductivity as the implanted ions, and therefore inhibit the formation of junctions.

摘要翻译： 公开了一种将离子注入工件而不形成影响工件性能的接合点的方法。 为了抵消注入到工件边缘中的掺杂剂的影响，由具有相反电导率的材料制成的部件被放置在工件附近。 当来自光束的离子撞击这些组分时，来自材料的离子被溅射。 这些离子具有与注入离子相反的导电性，因此抑制结的形成。

公开(公告)号：US07751172B2

公开(公告)日：2010-07-06

申请号：US11582814

申请日：2006-10-18

申请人： Ashwin M. Purohit ,  Dale Stone ,  Dave Broyer ,  Steve Drummond

发明人： Ashwin M. Purohit ,  Dale Stone ,  Dave Broyer ,  Steve Drummond

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  Y10S414/141

摘要： The present invention is directed to a system and a method for peeling a wafer off of an electrostatic clamp (ESC). The ESC removal system comprises a electrostatic clamp and a wafer electrically coupled and physically in contact with each other. A plurality of grippers or pins are arranged with respect to the wafer and the ESC to allow the wafer to be peeled off or removed section by section from the electrostatic clamp. The system and method allow the wafer to be removed with a much lower pull force than current systems and methods.

摘要翻译： 本发明涉及一种用于从静电夹（ESC）剥离晶片的系统和方法。 ESC去除系统包括电耦合和物理上彼此接触的静电夹和晶片。 相对于晶片和ESC布置多个夹持器或销，以允许晶片从静电夹具逐个剥离或逐个移除。 该系统和方法允许以比当前系统和方法更低的拉力去除晶片。

公开(公告)号：US20060131514A1

公开(公告)日：2006-06-22

申请号：US11022060

申请日：2004-12-22

申请人： Maria Anc ,  Dale Stone ,  Christopher Reddy

发明人： Maria Anc ,  Dale Stone ,  Christopher Reddy

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/165 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The implanter includes one or more removable inserts mounted to an interior of either the transport system or the ion implantation chamber for collecting material entering either the transport system or the ion implantation chamber due to collisions between ions and the workpiece within the ion implantation chamber during ion processing of the workpiece. A temperature control coupled to the one or more removable inserts for maintaining the temperature of the insert at a controlled temperature to promote formation of a film on said insert during ion treatment due to collisions between ions and said workpiece.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 注入机包括一个或多个可拆卸的插入件，其安装到输送系统或离子注入室的内部，用于收集进入输送系统或离子注入室的材料，这是由于离子和离子注入室内的工件之间的离子在离子 加工工件。 耦合到一个或多个可移除插入件的温度控制器，用于将插入件的温度保持在受控温度，以促进在离子处理期间由于离子和所述工件之间的碰撞而在所述插入件上形成膜。