发明授权
- 专利标题: Three-dimensional semiconductor memory devices
- 专利标题(中): 三维半导体存储器件
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申请号: US13291519申请日: 2011-11-08
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公开(公告)号: US08598647B2公开(公告)日: 2013-12-03
- 发明人: Dongwoo Kim , Toshiro Nakanishi , SeungHyun Lim , Bio Kim , Kihyun Hwang , Jaeyoung Ahn
- 申请人: Dongwoo Kim , Toshiro Nakanishi , SeungHyun Lim , Bio Kim , Kihyun Hwang , Jaeyoung Ahn
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Myers Bigel Sibley & Sajovec
- 优先权: KR10-2010-0110533 20101108
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
Provided are three-dimensional semiconductor devices. The device includes conductive patterns stacked on a substrate, and an active pattern penetrating the conductive patterns to be connected to the substrate. The active pattern includes a first doped region disposed adjacent to at least one of the conductive patterns, and a diffusion-resistant doped region overlapped with at least a portion of the first doped region. The diffusion-resistant doped region may be a region doped with carbon.
公开/授权文献
- US20120112260A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES 公开/授权日:2012-05-10
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