Invention Grant
- Patent Title: Method of forming a three-dimensional semiconductor memory device comprising sub-cells, terraced structures and strapping regions
- Patent Title (中): 形成三维半导体存储器件的方法,其包括子单元,梯形结构和捆扎区域
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Application No.: US13779334Application Date: 2013-02-27
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Publication No.: US08603906B2Publication Date: 2013-12-10
- Inventor: Sunil Shim , Sunghoi Hur , Hansoo Kim , Jaehoon Jang , Hoosung Cho
- Applicant: Sunil Shim , Sunghoi Hur , Hansoo Kim , Jaehoon Jang , Hoosung Cho
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2009-0110975 20091117
- Main IPC: H01L21/3205
- IPC: H01L21/3205 ; H01L21/4763

Abstract:
Provided is a three-dimensional semiconductor memory device. The three-dimensional semiconductor memory device includes a substrate that has a cell array region including a pair of sub-cell regions and a strapping region interposed between the pair of sub-cell regions. A Plurality of sub-gates are sequentially stacked on the substrate in each of the sub-cell regions, and interconnections are electrically connected to extensions of the stacked sub-gates, respectively, which extend into the strapping region. Each of the interconnections is electrically connected to the extensions of the sub-gate which are disposed in the pair of the sub-cell regions, respectively, and which are located at the same level.
Public/Granted literature
- US20130171806A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2013-07-04
Information query
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