发明授权
- 专利标题: Semiconductor device having SOI substrate
- 专利标题(中): 具有SOI衬底的半导体器件
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申请号: US12923469申请日: 2010-09-23
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公开(公告)号: US08604513B2公开(公告)日: 2013-12-10
- 发明人: Youichi Ashida , Norihito Tokura , Shigeki Takahashi , Yoshiaki Nakayama , Satoshi Shiraki , Kouji Senda
- 申请人: Youichi Ashida , Norihito Tokura , Shigeki Takahashi , Yoshiaki Nakayama , Satoshi Shiraki , Kouji Senda
- 申请人地址: JP Kariya
- 专利权人: DENSO CORPORATION
- 当前专利权人: DENSO CORPORATION
- 当前专利权人地址: JP Kariya
- 代理机构: Posz Law Group, PLC
- 优先权: JP2009-227157 20090930; JP2009-232421 20091006; JP2010-177427 20100806
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
A semiconductor device includes: a SOI substrate; a semiconductor element having first and second impurity layers disposed in an active layer of the SOI substrate, the second impurity layer surrounding the first impurity layer; and multiple first and second conductive type regions disposed in a part of the active layer adjacent to an embedded insulation film of the SOI substrate. The first and second conductive type regions are alternately arranged. The first and second conductive type regions have a layout, which corresponds to the semiconductor element.
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