发明授权
- 专利标题： Photoacid generator, resist composition, and patterning process
- 专利标题（中）： 光酸发生剂，抗蚀剂组合物和图案化工艺
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申请号： US12828557申请日： 2010-07-01
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公开(公告)号： US08609889B2公开(公告)日： 2013-12-17
- 发明人: Masaki Ohashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
- 申请人： Masaki Ohashi , Youichi Ohsawa , Takeshi Kinsho , Takeru Watanabe
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2009-157856 20090702
- 主分类号： G03F7/028
- IPC分类号： G03F7/028 ; G03F7/26 ; C07C309/06 ; C07C309/07
摘要：
The photoacid generator produces a sulfonic acid which has a bulky cyclic structure in the sulfonate moiety and a straight-chain hydrocarbon group and thus shows a controlled acid diffusion behavior and an adequate mobility. The PAG is fully compatible with a resin to form a resist composition which performs well during the device fabrication process and solves the problems of resolution, LWR, and exposure latitude.
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