- 专利标题: Solid-state imaging device, method of manufacturing solid-state imaging device, and electronic equipment
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申请号: US12906627申请日: 2010-10-18
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公开(公告)号: US08610807B2公开(公告)日: 2013-12-17
- 发明人: Yasunori Koshino , Atsushi Toda , Yoichi Otsuka
- 申请人: Yasunori Koshino , Atsushi Toda , Yoichi Otsuka
- 申请人地址: JP
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP
- 代理机构: Sheridan Ross P.C.
- 优先权: JP2009-246866 20091027
- 主分类号: H04N5/335
- IPC分类号: H04N5/335 ; H04N5/225 ; H01L31/18
摘要:
A solid-state imaging device includes a photoelectric transformation portion and a micro lens, the micro lens has a first refractive index layer which is a first refractive index and a second refractive index layer which is a second refractive index different from the first refractive index, wherein the micro lens is configured so that a vertical cross section, which is a surface perpendicular to the capturing surface, has a rectangular shape, wherein each of the first refractive index layer and the second refractive index layer are arranged adjacent to each other in a direction along the capturing surface, and an interface between the first refractive index layer and the second refractive index layer in the vertical cross section is formed so as to follow a direction perpendicular to the capturing surface.
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