Invention Grant
US08617652B2 Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength 失效
使用原子层沉积在纤维织物上沉积材料以提高刚性和强度

  • Patent Title: Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength
  • Patent Title (中): 使用原子层沉积在纤维织物上沉积材料以提高刚性和强度
  • Application No.: US13536646
    Application Date: 2012-06-28
  • Publication No.: US08617652B2
    Publication Date: 2013-12-31
  • Inventor: Sang In Lee
  • Applicant: Sang In Lee
  • Applicant Address: US CA Fremont
  • Assignee: Veeco ALD Inc.
  • Current Assignee: Veeco ALD Inc.
  • Current Assignee Address: US CA Fremont
  • Agency: Fenwick & West LLP
  • Main IPC: C23C16/30
  • IPC: C23C16/30
Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength
Abstract:
Embodiments relate to depositing on one or more layers of materials on a fiber or fiber containing material using atomic layer deposition (ALD) to provide or enhance functionalities of the fibers or fiber containing material. A layer of material is deposited coated on the fibers or fiber containing textile by causing the relative movement between a fiber or the fiber containing textile and a source injector. The surface of the material is oxidized, nitrified or carbonized to increase the volume of the deposited material. By increasing the volume of the material, the material is subject to compressive stress. The compressive stress renders the fibers or the fiber containing material more rigid, stronger and more resistant against bending force, impact or tensile force.
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