发明授权
- 专利标题： Laser formation of graphene
- 专利标题（中）： 激光形成石墨烯
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申请号： US12928229申请日： 2010-12-07
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公开(公告)号： US08617669B1公开(公告)日： 2013-12-31
- 发明人: Nathaniel R. Quick , Aravinda Kar
- 申请人： Nathaniel R. Quick , Aravinda Kar
- 专利权人： Partial Assignment to University of Central Florida
- 当前专利权人： Partial Assignment to University of Central Florida
- 代理机构： Frijouf, Rust & Pyle P.A.
- 主分类号： C23C8/00
- IPC分类号： C23C8/00 ; C23C16/00
摘要：
An apparatus and method is disclosed for synthesizing graphene comprising the steps of providing a substrate and focusing a laser beam in the presence of a carbon doping gas to induce photolytic decomposition of the gas to atomic carbon. The carbon is photolytically reacted with the substrate to grow graphene.
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