发明授权
US08623152B2 Reduction of entrance and exit marks left by a substrate-processing meniscus
有权
减少由基板处理半月板留下的入口和出口痕迹
- 专利标题: Reduction of entrance and exit marks left by a substrate-processing meniscus
- 专利标题(中): 减少由基板处理半月板留下的入口和出口痕迹
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申请号: US13671459申请日: 2012-11-07
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公开(公告)号: US08623152B2公开(公告)日: 2014-01-07
- 发明人: Robert O'Donnell , Mike Ravkin , John de Larios
- 申请人: Robert O'Donnell , Mike Ravkin , John de Larios
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: Martine Penilla Group, LLP
- 主分类号: B08B1/02
- IPC分类号: B08B1/02
摘要:
A substrate is moved in a linear direction simultaneously between a processing face of an upper proximity head and a processing face of a lower proximity head. As the substrate is moved, a first meniscus of processing liquid is generated between the processing face of the upper proximity head and a top surface of the substrate, and a second meniscus of processing liquid is generated between the processing face of the lower proximity head and a bottom surface of the substrate. The first meniscus has a meniscus protrusion extending in the linear direction in which the substrate is moved and positioned on a trailing side of the first meniscus relative to the linear direction in which the substrate is moved. The meniscus protrusion is centered on the substrate relative to a diameter of the substrate as measured perpendicular to the linear direction in which the substrate is moved.
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