Invention Grant
- Patent Title: Lithographic apparatus configured to suppress contamination from passing into the projection system and method
- Patent Title (中): 被配置为抑制污染物进入投影系统的方法的平版印刷装置
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Application No.: US12975898Application Date: 2010-12-22
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Publication No.: US08625068B2Publication Date: 2014-01-07
- Inventor: Han-Kwang Nienhuys , Peter Gerardus Jonkers , Alexander Marinus Arnoldus Huijberts
- Applicant: Han-Kwang Nienhuys , Peter Gerardus Jonkers , Alexander Marinus Arnoldus Huijberts
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
Public/Granted literature
- US20120002182A1 Lithographic Apparatus and Method Public/Granted day:2012-01-05
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