发明授权
US08628618B2 Precursor vapor generation and delivery system with filters and filter monitoring system
有权
前体蒸汽发生和输送系统具有过滤器和过滤器监控系统
- 专利标题： Precursor vapor generation and delivery system with filters and filter monitoring system
- 专利标题（中）： 前体蒸汽发生和输送系统具有过滤器和过滤器监控系统
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申请号： US12892279申请日： 2010-09-28
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公开(公告)号： US08628618B2公开(公告)日： 2014-01-14
- 发明人: Damien Slevin , Brad Laird , Curtis Bailey , Ming Li , Sirish Reddy , James Sims , Mohamed Sabri , Saangrut Sangplug
- 申请人： Damien Slevin , Brad Laird , Curtis Bailey , Ming Li , Sirish Reddy , James Sims , Mohamed Sabri , Saangrut Sangplug
- 申请人地址： US CA San Jose
- 专利权人： Novellus Systems Inc.
- 当前专利权人： Novellus Systems Inc.
- 当前专利权人地址： US CA San Jose
- 主分类号： C23C16/52
- IPC分类号： C23C16/52 ; C23C16/448 ; C23C16/455 ; C23C16/50 ; C23C16/00
摘要：
A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.