Invention Grant
- Patent Title: Forming curved features using a shadow mask
- Patent Title (中): 使用荫罩形成弯曲的特征
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Application No.: US13077531Application Date: 2011-03-31
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Publication No.: US08628677B2Publication Date: 2014-01-14
- Inventor: Gregory De Brabander , Mark Nepomnishy
- Applicant: Gregory De Brabander , Mark Nepomnishy
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Fish & Richardson P.C.
- Main IPC: C03C15/00
- IPC: C03C15/00

Abstract:
Processes for making a profile-transferring substrate surface and membranes having curved features are disclosed. A profile-transferring substrate surface having a curved feature is created by isotropic plasma etching through a shadow mask. The shadow mask has a through hole which has a lower portion adjacent to the bottom surface of the shadow mask and an upper portion that is above and narrower than the lower portion. The isotropic plasma etching through the shadow mask can create a curved dent in a planar substrate in a central portion of an area enclosed by the bottom opening. After the shadow mask is removed. A uniform layer of material deposited over the exposed surface of the substrate will include a curved feature at the location of the curved dent in the substrate surface.
Public/Granted literature
- US20120252221A1 FORMING CURVED FEATURES USING A SHADOW MASK Public/Granted day:2012-10-04
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