发明授权
- 专利标题: Solid-state imaging device, method of manufacturing solid-state imaging device, and electronic apparatus
- 专利标题(中): 固态成像装置,制造固态成像装置的方法和电子装置
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申请号: US13053455申请日: 2011-03-22
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公开(公告)号: US08629484B2公开(公告)日: 2014-01-14
- 发明人: Hiroyuki Ohri , Takashi Machida , Takahiro Kawamura , Yasunori Sogoh
- 申请人: Hiroyuki Ohri , Takashi Machida , Takahiro Kawamura , Yasunori Sogoh
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Dentons US LLP
- 优先权: JP2010-083600 20100331
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
Disclosed herein is a solid-state imaging device including: a semiconductor region of a second conductivity type which is formed on a face side of a semiconductor substrate; a photoelectric conversion element which has an impurity region of a first conductivity type and which is operable to generate electric charge according to the amount of incident light and to accumulate the electric charge in the inside thereof; an electric-charge holding region which has an impurity region of the first conductivity type and in which the electric charge generated through photoelectric conversion by the photoelectric conversion element is held until read out; an intermediate transfer path through which only the electric charge generated by the photoelectric conversion element during an exposure period and being in excess of a predetermined electric charge amount is transferred into the electric-charge holding region; and an impurity layer.
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