发明授权
US08629495B2 High frequency field-effect transistor 失效
高频场效应晶体管

  • 专利标题: High frequency field-effect transistor
  • 专利标题(中): 高频场效应晶体管
  • 申请号: US12937701
    申请日: 2009-04-15
  • 公开(公告)号: US08629495B2
    公开(公告)日: 2014-01-14
  • 发明人: Lukas Frederik Tiemeijer
  • 申请人: Lukas Frederik Tiemeijer
  • 申请人地址: NL Eindhoven
  • 专利权人: NXP, B.V.
  • 当前专利权人: NXP, B.V.
  • 当前专利权人地址: NL Eindhoven
  • 优先权: EP08103544 20080415; EP08166767 20081016
  • 国际申请: PCT/IB2009/051568 WO 20090415
  • 国际公布: WO2009/128035 WO 20091022
  • 主分类号: H01L29/66
  • IPC分类号: H01L29/66
High frequency field-effect transistor
摘要:
The invention relates to a field-effect transistor having a higher efficiency than the known field-effect transistors, in particular at higher operating frequencies. This is achieved by electrically connecting sources of a plurality of main current paths by means of a strap line (SL) being inductively coupled to a gate line (Gtl) and/or a drain line (Drnl) for forming an additional RF-return current path parallel to the RF-return current path in a semiconductor body (SB). The invention further relates to a field-effect transistor package, a power amplifier, a multi-stage power amplifier and a base station comprising such a field-effect transistor.
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