发明授权
- 专利标题: High frequency field-effect transistor
- 专利标题(中): 高频场效应晶体管
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申请号: US12937701申请日: 2009-04-15
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公开(公告)号: US08629495B2公开(公告)日: 2014-01-14
- 发明人: Lukas Frederik Tiemeijer
- 申请人: Lukas Frederik Tiemeijer
- 申请人地址: NL Eindhoven
- 专利权人: NXP, B.V.
- 当前专利权人: NXP, B.V.
- 当前专利权人地址: NL Eindhoven
- 优先权: EP08103544 20080415; EP08166767 20081016
- 国际申请: PCT/IB2009/051568 WO 20090415
- 国际公布: WO2009/128035 WO 20091022
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
The invention relates to a field-effect transistor having a higher efficiency than the known field-effect transistors, in particular at higher operating frequencies. This is achieved by electrically connecting sources of a plurality of main current paths by means of a strap line (SL) being inductively coupled to a gate line (Gtl) and/or a drain line (Drnl) for forming an additional RF-return current path parallel to the RF-return current path in a semiconductor body (SB). The invention further relates to a field-effect transistor package, a power amplifier, a multi-stage power amplifier and a base station comprising such a field-effect transistor.
公开/授权文献
- US20110024835A1 HIGH FREQUENCY FIELD-EFFECT TRANSISTOR 公开/授权日:2011-02-03
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