发明授权
- 专利标题： Method of using mask film to form relief images
- 专利标题（中）： 使用掩模膜形成浮雕图像的方法
-
申请号： US13468376申请日： 2012-05-10
-
公开(公告)号： US08632944B2公开(公告)日： 2014-01-21
- 发明人: Gregory L. Zwadlo , David E. Brown , Elsie A. Fohrenkamm , A. Peter Stolt
- 申请人： Gregory L. Zwadlo , David E. Brown , Elsie A. Fohrenkamm , A. Peter Stolt
- 申请人地址： US NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： US NY Rochester
- 代理商 J. Lanny Tucker
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index layer modifies the path of incident radiation during mask image transfer so as to provide steeper shoulder angles in the relief image solid areas. This mask film is used to form a relief image such as in a flexographic printing plate.
公开/授权文献
- US20120219773A1 METHOD OF USING MASK FILM TO FORM RELIEF IMAGES 公开/授权日：2012-08-30
信息查询
