发明授权
- 专利标题: Scanning electron microscope and inspection method using same
- 专利标题(中): 扫描电子显微镜及使用相同的检查方法
-
申请号: US13521254申请日: 2011-02-18
-
公开(公告)号: US08637820B2公开(公告)日: 2014-01-28
- 发明人: Yasunari Sohda , Takeyoshi Ohashi , Kaori Shirahata , Keiichiro Hitomi
- 申请人: Yasunari Sohda , Takeyoshi Ohashi , Kaori Shirahata , Keiichiro Hitomi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles & Stockbridge P.C.
- 优先权: JP2010-045509 20100302
- 国际申请: PCT/JP2011/053440 WO 20110218
- 国际公布: WO2011/108368 WO 20110909
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/147 ; H01J37/09 ; H01J37/145
摘要:
Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
公开/授权文献
信息查询