-
公开(公告)号：US20210099599A1
公开(公告)日：2021-04-01
申请号：US17034616
申请日：2020-09-28
申请人： Xiaofeng HAN , Keiichiro HITOMI , Shikou MIYAMOTO
发明人： Xiaofeng HAN , Keiichiro HITOMI , Shikou MIYAMOTO
IPC分类号： H04N1/00
摘要： An authentication system includes a shared terminal; and at least one information processing apparatus coupled to the shared terminal via a communication network. The shared terminal includes an authentication controller configured to, upon detecting that the shared terminal is activated, acquire authentication screen data, from the at least one information processing apparatus, for authentication performed for using an internal function of the shared terminal, display an authentication screen based on the acquired authentication screen data, and transmit, to the at least one information processing apparatus, input information that is input to the displayed authentication screen by a user; and an internal function operator configured to display a screen for using the internal function of the shared terminal, upon acquiring information indicating that an authentication process, which is performed based on the input information at the at least one information processing apparatus, is successful.
-
2.发明申请公开(公告)号：US20180068345A1
公开(公告)日：2018-03-08
申请号：US15697030
申请日：2017-09-06
CPC分类号： G06Q30/0251 , G06Q30/02 , H04N1/00244 , H04N1/00392 , H04N1/00411 , H04N1/00477 , H04N2201/0094
摘要： An information processing apparatus includes processors to control a display of a setting information reception screen used to receive setting information, and an execution instruction of information processing, a primary memory to store a primary application used for requesting the processors to execute the information processing based on the setting information and the execution instruction, and a secondary memory to store a secondary application, and a function providing application. When the secondary application receives an instruction, the secondary application transfers the instruction to the function providing application. The function providing application displays the setting information reception screen on a display after receiving a request for displaying the setting information reception screen from the secondary application, and requests the execution of the information processing based on the setting information and the execution instruction to the primary application after receiving a request for executing the information processing from the secondary application.
-
3.发明授权Pattern dimension measurement method and charged particle beam microscope used in same 有权图案尺寸测量方法和使用的带电粒子束显微镜公开(公告)号：US09200896B2
公开(公告)日：2015-12-01
申请号：US13504129
申请日：2010-09-30
CPC分类号： G01B15/00 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
摘要翻译： 为了提供即使发生散焦而具有小的测量误差和优异的再现性的图案尺寸测量方法，并且在其中使用带电粒子束显微镜，在将带电粒子束施加到形成有待测量图案的样本的方法中 通过阈值法计算来自样本的信号带电粒子的信号强度分布的图案尺寸，对应于图案边缘的最大信号强度点右侧和左侧的边缘索引位置（X1）和（X2） 并且从位置之间的平均值找到图案边缘位置（Xe）。 因此，可以减小散焦对图案边缘位置（Xe）的影响。
-
公开(公告)号：US09110384B2
公开(公告)日：2015-08-18
申请号：US13522984
申请日：2011-01-21
CPC分类号： G03F7/70625 , H01J37/222 , H01J37/28 , H01J2237/1536 , H01J2237/226 , H01J2237/24571 , H01J2237/2809 , H01J2237/2817
摘要： Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.
摘要翻译： 公开了一种具有用于测量样品（413）上的图案的尺寸的计算装置（403）的扫描电子显微镜，其特征在于，计算并存储由电子束照射引起的图案形状的变化量 在扫描电子显微镜图像（612; 813; 1510）中从扫描电子显微镜图像（612; 813; 1510）中的图案形状轮廓（613; 814; 1511）恢复在用电子束照射样品之前的图案形状轮廓（614; 815; 1512） 使用计算量用电子束照射样品，然后显示图案形状轮廓（614; 815; 1512）。 因此，消除了当用电子束照射样品时引起的抗蚀剂收缩和/或静电电荷的影响，从而能够以高的电压恢复照射电子束之前的二维图案的形状轮廓 使用恢复的图像，可以高精度地测量图案的精度和尺寸。
-
公开(公告)号：US20120286158A1
公开(公告)日：2012-11-15
申请号：US13521254
申请日：2011-02-18
CPC分类号： H01J37/28 , H01J37/09 , H01J37/145 , H01J2237/1506 , H01J2237/1534 , H01J2237/2611
摘要： Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
摘要翻译： 提供了一种具有最小像差的高分辨率扫描电子显微镜，并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中，电磁偏转器（201）设置在磁性透镜（207）的上方，并且设置使电子加速或减速的控制电极（202）重叠（以使得高度位置重叠 相对于垂直方向）与电磁偏转器（201）。 在宽场极化中，电极被加速，并且在倾斜的波束形成中，电子被减速。
-
6.发明授权Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction method 有权标准校正元件，扫描电子显微镜及其扫描电子显微镜校正方法公开(公告)号：US08263929B2
公开(公告)日：2012-09-11
申请号：US13057235
申请日：2009-07-31
IPC分类号： G01J1/10
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment.
摘要翻译： 公开了一种标准样品，与电子显微镜一起使用以高精度校正放大率。 用于校正的标准构件基于通过扫描测量样本上的观察区域上的入射电子线扫描产生的二次电子信息或关于反射电子强度的信息来校正观察区域内的图案的扫描电子显微镜。 标准构件具有第一图案区域，该第一图案区域校正放大率，并且在层压的多层膜的横截面中包括凹凸图案（线/空间图案），以及在第一图案附近的第二图案区域 相同的高度不包含与第一区域的图案间距尺寸相同的周期性的图案，并且用于光束调节。
-
7.发明申请Standard Member for Correction, Scanning Electron Microscope Using Same, and Scanning Electron Microscope Correction Method 有权标准校正成员，使用扫描电子显微镜和扫描电子显微镜校正方法公开(公告)号：US20110133065A1
公开(公告)日：2011-06-09
申请号：US13057235
申请日：2009-07-31
IPC分类号： G01D18/00 , G01N23/00 , G01N23/225
CPC分类号： H01J37/28 , B82Y15/00 , H01J2237/2826
摘要： Disclosed is a standard specimen, used with an electron microscope to correct the magnification with high precision. A standard member used for correction corrects a scanning electron microscope that measures a pattern within an observation region based on information about the secondary electrons generated by scanning incident electron lines on the observation region on a measurement specimen, or information about the reflected electron intensity. The standard member has a first pattern region that corrects the magnification and that comprises a concavo-convex pattern (line/space pattern) in the cross section of a multilayer film that has been laminated, and a second pattern region near the first pattern at almost the same height that does not contain a pattern with the same periodicity as the pattern pitch size of the first region and that is used for beam adjustment.
摘要翻译： 公开了一种标准样品，与电子显微镜一起使用以高精度校正放大率。 用于校正的标准构件基于通过扫描测量样本上的观察区域上的入射电子线扫描产生的二次电子信息或关于反射电子强度的信息来校正观察区域内的图案的扫描电子显微镜。 标准构件具有第一图案区域，该第一图案区域校正放大率，并且在层压的多层膜的横截面中包括凹凸图案（线/空间图案），以及在第一图案附近的第二图案区域 相同的高度不包含与第一区域的图案间距尺寸相同的周期性的图案，并且用于光束调节。
-
8.发明授权公开(公告)号：US07875850B2
公开(公告)日：2011-01-25
申请号：US12078516
申请日：2008-04-01
CPC分类号： G01N23/225 , H01J37/28 , H01J2237/20 , H01J2237/2826 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system, and provides an electron-beam system using it. The standard component for calibration is one that calibrates a scale factor of an electron-beam system based on a signal of secondary charged particles detected by irradiation of a primary electron beam on a substrate having a cross section of a superlattice of a multi-layer structure in which different materials are deposited alternately. The substrate has linear patterns on the substrate surface parallel to the multi-layers and are arranged at a fixed interval in a direction crossing the cross section of the superlattice pattern, and the cross sections of the linear patterns are on substantially the same plane of the superlattice cross section, so that the linear patterns enable a position of the superlattice pattern to be identified.
摘要翻译： 本发明提供了一种用于校准的标准组件，其使得能够容易地指定校准位置，以便准确地校准电子束系统中的比例因子，并提供使用该电子束系统的电子束系统。 用于校准的标准组件是基于通过在具有多层结构的超晶格的横截面的基板上照射一次电子束而检测的二次带电粒子的信号来校准电子束系统的比例因子的标准组件 其中不同的材料交替沉积。 衬底在平行于多层的衬底表面上具有线性图案，并且在与超晶格图案的横截面交叉的方向上以固定的间隔布置，并且线状图案的横截面在 超晶格截面，使得线性图案能够识别超晶格图案的位置。
-
公开(公告)号：US10416940B2
公开(公告)日：2019-09-17
申请号：US15921713
申请日：2018-03-15
申请人： Hiroki Asakimori , Tomohiro Kuroyanagi , Yuuta Saitoh , Nobuya Monden , Yohsuke Utoh , Keiichiro Hitomi
发明人： Hiroki Asakimori , Tomohiro Kuroyanagi , Yuuta Saitoh , Nobuya Monden , Yohsuke Utoh , Keiichiro Hitomi
IPC分类号： G06F3/12
摘要： Example embodiments of the present disclosure include image processing apparatus installed with a web browser that includes circuitry and an image processing device. The circuitry interprets content obtained from a web server connected to the image processing apparatus via a network, displays a screen based on the interpreted content, requests the web server to process according to a user input on the displayed screen, and requests the image processing device to perform predetermined image processing.
-
公开(公告)号：US08478021B2
公开(公告)日：2013-07-02
申请号：US13142316
申请日：2010-01-13
CPC分类号： G01B15/00 , H01J37/153 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/216 , H01L22/12
摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.
摘要翻译： 为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许 电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息 进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。
-
-
-
-
-
-
-
-
-
搜索结果
28 条记录 (耗时 0.019 秒)
