发明授权
- 专利标题: Semiconductor switching device and method of making the same
- 专利标题(中): 半导体开关器件及其制造方法
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申请号: US13155757申请日: 2011-06-08
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公开(公告)号: US08642460B2公开(公告)日: 2014-02-04
- 发明人: Chih-Chao Yang , Stephen A Cohen , Baozhen Li
- 申请人: Chih-Chao Yang , Stephen A Cohen , Baozhen Li
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Parashos Kalaitzis
- 主分类号: H01L21/44
- IPC分类号: H01L21/44
摘要:
A switching device including a first dielectric layer having a first top surface, two conductive features embedded in the first dielectric layer, each conductive feature having a second top surface that is substantially coplanar with the first top surface of the first dielectric layer, and a set of discrete islands of a low diffusion mobility metal between the two conductive features. The discrete islands of the low diffusion mobility metal may be either on the first top surface or embedded in the first dielectric layer. The electric conductivity across the two conductive features of the switching device increases when a prescribed voltage is applied to the two conductive features. A method of forming such a switching device is also provided.
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