发明授权
- 专利标题： Annular baffle
- 专利标题（中）： 环形挡板
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申请号： US12109332申请日： 2008-04-24
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公开(公告)号： US08647438B2公开(公告)日： 2014-02-11
- 发明人: Daniel J. Hoffman , Kallol Bera
- 申请人： Daniel J. Hoffman , Kallol Bera
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; C23F1/00
摘要：
A baffle assembly for an etching apparatus is disclosed. The baffle assembly comprises a ring and a lower baffle portion having a curved wall extending between a flange portion and a lower frame portion. A heating assembly may be present within the lower frame portion to control the temperature of the baffle. The baffle assembly may help confine the plasma within the processing space in the chamber. The ring may comprise silicon carbide and the lower baffle portion may comprise aluminum.
公开/授权文献
- US20080314571A1 ANNULAR BAFFLE 公开/授权日：2008-12-25
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