发明授权
- 专利标题： Etching composition
- 专利标题（中）： 蚀刻组成
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申请号： US13415390申请日： 2012-03-08
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公开(公告)号： US08647523B2公开(公告)日： 2014-02-11
- 发明人: Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
- 申请人： Tomonori Takahashi , Tadashi Inaba , Atsushi Mizutani , Bing Du , William A. Wojtczak , Kazutaka Takahashi , Tetsuya Kamimura
- 申请人地址： US RI North Kingstown JP Tokyo
- 专利权人： Fujifilm Electronic Materials U.S.A., Inc.,Fujifilm Corporation
- 当前专利权人： Fujifilm Electronic Materials U.S.A., Inc.,Fujifilm Corporation
- 当前专利权人地址： US RI North Kingstown JP Tokyo
- 代理机构： Fish & Richardson P.C.
- 主分类号： C03C15/00
- IPC分类号： C03C15/00
摘要：
This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.
公开/授权文献
- US20120231632A1 Novel Etching Composition 公开/授权日：2012-09-13
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