发明授权
- 专利标题: Semiconductor device and method of manufacturing semiconductor device
- 专利标题(中): 半导体装置及其制造方法
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申请号: US13106590申请日: 2011-05-12
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公开(公告)号: US08648441B2公开(公告)日: 2014-02-11
- 发明人: Kenichiro Hijioka , Ippei Kume , Naoya Inoue , Hiroki Shirai , Jun Kawahara , Yoshihiro Hayashi
- 申请人: Kenichiro Hijioka , Ippei Kume , Naoya Inoue , Hiroki Shirai , Jun Kawahara , Yoshihiro Hayashi
- 申请人地址: JP Kanagawa
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kanagawa
- 代理机构: Foley & Lardner LLP
- 优先权: JP2010-115755 20100519; JP2010-270310 20101203
- 主分类号: H01L21/02
- IPC分类号: H01L21/02
摘要:
A semiconductor device has a substrate; a multi-layered interconnect formed on the substrate, and having a plurality of interconnect layers, each of which being configured by an interconnect and an insulating layer, stacked therein; a memory circuit formed in a memory circuit region on the substrate in a plan view, and having a peripheral circuit and at least one capacitor element embedded in the multi-layered interconnect; and a logic circuit formed in a logic circuit region on the substrate, wherein the capacitor element is configured by a lower electrode, a capacitor insulating film, an upper electrode, an embedded electrode and an upper interconnect; the top surface of the upper interconnect, and the top surface of the interconnect configuring the logic circuit formed in the same interconnect layer with the upper interconnect, are aligned to the same plane.
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