发明授权
- 专利标题: Nonvolatile semiconductor memory device including a via-hole with a narrowing cross-section and method of manufacturing the same
- 专利标题(中): 包括具有窄截面的通孔的非易失性半导体存储器件及其制造方法
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申请号: US13454625申请日: 2012-04-24
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公开(公告)号: US08648471B2公开(公告)日: 2014-02-11
- 发明人: Hideyuki Tabata , Eiji Ito , Hirofumi Inoue
- 申请人: Hideyuki Tabata , Eiji Ito , Hirofumi Inoue
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-303668 20071122
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L23/52 ; H01L23/40
摘要:
A nonvolatile semiconductor memory device comprises a semiconductor substrate; a cell array block formed on the semiconductor substrate and including plural stacked cell array layers each with a plurality of first lines, a plurality of second lines crossing the plurality of first lines, and memory cells connected at intersections of the first and second lines between both lines; and a plurality of via-holes extending in the stacked direction of the cell array layers to individually connect the first or second line in the each cell array layer to the semiconductor substrate. The via-holes are formed continuously through the plural cell array layers, and multiple via-holes having equal lower end positions and upper end positions are connected to the first or second lines in different cell array layers.
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