发明授权
- 专利标题: Sputtering target for producing metallic glass membrane and manufacturing method thereof
- 专利标题(中): 制造金属玻璃膜的溅射靶及其制造方法
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申请号: US12854683申请日: 2010-08-11
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公开(公告)号: US08652399B2公开(公告)日: 2014-02-18
- 发明人: Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
- 申请人: Atsushi Nakamura , Masataka Yahagi , Akihisa Inoue , Hisamichi Kimura , Shin-ichi Yamaura
- 申请人地址: JP Tokyo JP Miyagi
- 专利权人: JX Nippon Mining & Metals Corporation,Tohoku University
- 当前专利权人: JX Nippon Mining & Metals Corporation,Tohoku University
- 当前专利权人地址: JP Tokyo JP Miyagi
- 代理机构: Howson & Howson LLP
- 优先权: JP2004-330411 20041115
- 主分类号: C22C1/04
- IPC分类号: C22C1/04
摘要:
A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50 μm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.
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