Invention Grant
- Patent Title: Liquid ejection head and process for producing the same
- Patent Title (中): 液体喷射头及其制造方法
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Application No.: US13359249Application Date: 2012-01-26
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Publication No.: US08652767B2Publication Date: 2014-02-18
- Inventor: Makoto Watanabe , Yoshinori Tagawa , Hiroyuki Murayama , Mitsuru Chida , Masataka Nagai
- Applicant: Makoto Watanabe , Yoshinori Tagawa , Hiroyuki Murayama , Mitsuru Chida , Masataka Nagai
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-042028 20110228
- Main IPC: G03F1/00
- IPC: G03F1/00

Abstract:
Provided is a process for producing a liquid ejection head including an ejection orifice member having a plurality of ejection orifices for ejecting liquid provided along an arrangement direction, the process including preparing a substrate provided with a resin layer which contains a photocurable resin; carrying out a first exposure treatment and a second exposure treatment which are each of an exposure treatment of subjecting the resin layer to exposure; and forming the ejection orifices of the resin layer subjected to the first exposure treatment and the second exposure treatment. An inclination angle of a side wall of the ejection orifices formed by the first exposure treatment with respect to the substrate differs from an inclination angle of a side wall of the ejection orifices formed by the second exposure treatment with respect to the substrate.
Public/Granted literature
- US20120218350A1 LIQUID EJECTION HEAD AND PROCESS FOR PRODUCING THE SAME Public/Granted day:2012-08-30
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