Invention Grant
US08653211B2 Random copolymer for forming neutral surface and methods of manufacturing and using the same
有权
用于形成中性表面的无规共聚物及其制造和使用方法
- Patent Title: Random copolymer for forming neutral surface and methods of manufacturing and using the same
- Patent Title (中): 用于形成中性表面的无规共聚物及其制造和使用方法
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Application No.: US13459588Application Date: 2012-04-30
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Publication No.: US08653211B2Publication Date: 2014-02-18
- Inventor: Min-Hyuck Kang , Su-Mi Lee , Eun-Ae Kwak , Moon-Gyu Lee , Bong-Jin Moon , Suk-Ho Kim , Ju-Hee Kim , Won-Tae Joo
- Applicant: Min-Hyuck Kang , Su-Mi Lee , Eun-Ae Kwak , Moon-Gyu Lee , Bong-Jin Moon , Suk-Ho Kim , Ju-Hee Kim , Won-Tae Joo
- Applicant Address: KR KR
- Assignee: Samsung Display Co., Ltd.,Industry-University Cooperation Foundation Sogang University
- Current Assignee: Samsung Display Co., Ltd.,Industry-University Cooperation Foundation Sogang University
- Current Assignee Address: KR KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2011-0040942 20110429
- Main IPC: C08F4/32
- IPC: C08F4/32 ; C08F12/08 ; C08F120/20
Abstract:
A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.
Public/Granted literature
- US20120273460A1 RANDOM COPOLYMER FOR FORMING NEUTRAL SURFACE AND METHODS OF MANUFACTURING AND USING THE SAME Public/Granted day:2012-11-01
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