Invention Grant
- Patent Title: Nitride semiconductor laser element and method for manufacturing same
- Patent Title (中): 氮化物半导体激光元件及其制造方法
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Application No.: US13194046Application Date: 2011-07-29
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Publication No.: US08654808B2Publication Date: 2014-02-18
- Inventor: Tomonori Morizumi
- Applicant: Tomonori Morizumi
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2010-177270 20100806
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride semiconductor laser element has: a nitride semiconductor layer having cavity planes at the ends of a waveguide region, an insulating film formed on an upper face of the nitride semiconductor layer so that the ends on the cavity plane side are isolated from cavity planes, and a first film formed from the cavity plane to the upper face of the nitride semiconductor layer, and covered part of the insulating film surface, the first film has a first region that is in contact with the nitride semiconductor and a second region that is in contact with the insulating film, and is formed from AlxGa1-xN (0
Public/Granted literature
- US20120033698A1 NITRIDE SEMICONDUCTOR LASER ELEMENT AND METHOD FOR MANUFACTURING SAME Public/Granted day:2012-02-09
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