Invention Grant
- Patent Title: Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications
- Patent Title (中): 组合式开发半导体应用中去除胶水的清洁配方
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Application No.: US13058803Application Date: 2009-08-12
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Publication No.: US08657966B2Publication Date: 2014-02-25
- Inventor: Nikhil D. Kalyankar , Chi-I Lang , Zachary Fresco
- Applicant: Nikhil D. Kalyankar , Chi-I Lang , Zachary Fresco
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- International Application: PCT/US2009/053624 WO 20090812
- International Announcement: WO2010/019722 WO 20100218
- Main IPC: B08B3/00
- IPC: B08B3/00 ; C11D7/00
Abstract:
Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask.
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