发明授权
- 专利标题： Method of forming pattern
- 专利标题（中）： 形成图案的方法
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申请号： US13216903申请日： 2011-08-24
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公开(公告)号： US08663907B2公开(公告)日： 2014-03-04
- 发明人: Keita Kato , Sou Kamimura , Yuichiro Enomoto , Kaoru Iwato , Shohei Kataoka , Shoichi Saitoh
- 申请人： Keita Kato , Sou Kamimura , Yuichiro Enomoto , Kaoru Iwato , Shohei Kataoka , Shoichi Saitoh
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2010-188639 20100825
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.
公开/授权文献
- US20120052449A1 METHOD OF FORMING PATTERN 公开/授权日：2012-03-01
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