发明授权
- 专利标题: Implant method and implanter by using a variable aperture
- 专利标题(中): 通过使用可变孔径进行植入法和注入机
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申请号: US12748877申请日: 2010-03-29
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公开(公告)号: US08669539B2公开(公告)日: 2014-03-11
- 发明人: Zhimin Wan , John D. Pollock , Don Berrian , Causon Ko-Chuan Jen
- 申请人: Zhimin Wan , John D. Pollock , Don Berrian , Causon Ko-Chuan Jen
- 申请人地址: US CA San Jose
- 专利权人: Advanced Ion Beam Technology, Inc.
- 当前专利权人: Advanced Ion Beam Technology, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Morrison & Foerster LLP
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/02
摘要:
A variable aperture within an aperture device is used to shape the ion beam before the substrate is implanted by shaped ion beam, especially to finally shape the ion beam in a position right in front of the substrate. Hence, different portions of a substrate, or different substrates, can be implanted respectively by different shaped ion beams without going through using multiple fixed apertures or retuning the ion beam each time. In other words, different implantations may be achieved respectively by customized ion beams without high cost (use multiple fixed aperture devices) and complex operation (retuning the ion beam each time). Moreover, the beam tune process for acquiring a specific ion beam to be implanted may be accelerated, to be faster than using multiple fixed aperture(s) and/or retuning the ion beam each time, because the adjustment of the variable aperture may be achieved simply by mechanical operation.